Olympus MPlanFL N 20X Epi Objective | 0.40 NA, BD, Infinity Corrected MICROSCOPES 173 and fluorescence imaging of living

and fluorescence imaging of living cells in thick vessels

identifying minerals

Color Correction

second harmonic generation (SHG)

Semiconductor wafer probing and testing

Olympus MPlanFL N 20X Epi Objective | 0.40 NA, BD, Infinity Corrected MICROSCOPES 173 and fluorescence imaging of livingPremium 20 objective with brightfield and darkfield capability ideal for industrial inspection and materials science applications. 20 Magnification, NA 0. 45 High resolution for detailed imaging and defect detection. Brightfield Darkfield (BD) Capability Dual mode imaging for enhanced contrast and defect detection on reflective surfaces. Working Distance (3 mm) Adequate clearance for standard industrial specimens. MPLFLN Plan Semi Apochromat Design